Haestad Product Line: New Version Release of SewerGEMS V8i

We are happy to announce that Bentley SewerGEMS V8i (SELECTseries 3) is now available for download on selectservices.bentley.com (build SELECT subscribers can log in and download the new product directly from Bentley's website. This is a significant release with a number of key new features. Highlights of these features include:

Common file format with other Bentley's sewer and stormwater products:

With SewerGEMS, SewerCAD, CivilStorm, and StormCAD's new unified file format, the .stws file replaces the .swg, swc, csd and .stc files. This common file format makes modeling teams’ workflows more efficient, since a model created in any one of these products can now be seamlessly opened and edited in another.

Updated support for MicroStation, AutoCAD and ArcGIS platforms:

You can run SewerGEMS from within MicroStation V8i (SELECTseries 3), ArcGIS 10 and 10.1 or AutoCAD 2013 (32- and 64-bit).

i-model publishing:

SewerGEMS can now publish i-models (containers for the open exchange of infrastructure information) in 2D or 3D.

Multiple solvers:

The SewerCAD and StormCAD solvers (gradually varied flow convex and gradually varied flow rational) are now included in SewerGEMS, making SewerGEMS a full superset of SewerCAD, StormCAD, and CivilStorm.

constraint based design:

SewerGEMS now offers constraint-based design capabilities for sanitary and storm sewers.

LID elements:

Low-impact development (LID) controls can now be analyzed in SewerGEMS.

See the What’s New page for more: http://www.bentley.com/en-US/Products/SewerGEMS/Whats-new.htm. Additional information one the items above and other new or updated features will be included in a "What's New" TechNote which will be available soon from the Hydraulics and Hydrology TechNotes and FAQs page (http://communities.bentley.com/products/hydraulics___hydrology/w/hydraulics_and_hydrology__wiki/selectsupport-technotes-and-faqs.aspx).

(Note that the SELECTseries 3 release of CivilStorm, StormCAD and SewerCAD will follow in the soon.)