I have a text style which has the background mask turned on and set to a 0.35 (in text ht. units) offset. This text style is being used within a dimension style. My issue comes when trying to use this dimension style within Connect Edition. When I try to use it, the background mask area is huge (probably 10X the text ht.). If I simply go to the text style, go to the text tab, switch text styles to anything else, and then go right back to the original text style, everything is good. The mask will then come in correctly when using the dimensions. I tried to get into a file and first place just text and just a note using that text style, and both worked perfectly. It is only when using it with the dimensioning tools (dimension linear or angular) that this is an issue. Any ideas? If it helps, I have posted the master DGN file as well as the DGNLIB where the style is stored.
Microstation PowerDraft 10.10.00.23
This has happened to me as well but not with dimensions. I have a macro that I use to add the background colour to text, which works a treat with SS4 but does as you noted (large area) in CONNECT. Have to revert to SS4 to use this!
I have tested this and it works ok for me. in CE10. Can you post an image of what you are seeing. NOTE: I created the Text and DIM style in CE
It seems like it would work generally speaking, but there is some issue when it is trying to read from the DGNLIB file. Again, I can edit the dimension style to switch text styles, and then immediately switch back to what it was without doing anything else, and it works fine. Attached is what the dimension looks like before I adjust it. The black area is the area of the background mask.
Has anyone found a solution to this issue? I am facing the same thing.
I am having this issue too (MicroStation V8i (SS10)